Solution
In the CMP process of "military competition", for the flattening treatment of silicon wafers or other substrate materials, it is necessary to filter products with large particle sizes, retain effective working particles for grinding, and achieve the optimal fluid dynamics state.
With the refinement requirements of processing line width, the cleanliness control of products is becoming increasingly strict. The precipitation requirements of various pollutants and metal ions have put forward higher requirements for the production of filter cartridges. Dali Filter combines reality to provide high cleanliness products for process upgrades, ensuring product quality.